№ files_lp_3_process_9_62668
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This document provides a step-by-step guideline for spin coating, exposing, and developing AZ nLOF 2020 resist on 100 mm substrates, intended as a template for photolithography processes.
Year:
N/A
Region / City:
N/A
Topic:
Photolithography process
Document type:
Process flow
Organization / Institution:
N/A
Author:
N/A
Target audience:
Engineers, Researchers
Validity period:
N/A
Approval date:
N/A
Modification date:
N/A
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Batch name:
Process template
Objective:
Guideline for spin coating, exposure, and development of AZ nLOF 2020
Resist:
AZ nLOF 2020
Substrate size:
4” substrates
Substrate materials:
Si, SiO2, Borofloat
Process type:
UV lithography
Equipment:
Gamma UV Spin Coater, KS Aligner, MA6 – 2 Mask Aligner, Automatic Developer (TMAH UV-lithography), Optical Microscope
Pretreatment options:
BHF dip (30 s, H2O 5 min) or HMDS treatment
Spin parameters:
30 s @ 3300 rpm (2 µm)
Softbake:
60 s @ 110 °C
Exposure mode:
Soft contact
Exposure dose:
112 mJ/cm2
Post Exposure Bake:
60 s @ 110 °C (120 s recommended for Borofloat)
Developer:
TMAH (AZ 726 MIF)
Development time:
30 s or 60 s (single puddle)
Inspection method:
Optical microscopy
Application context:
Cleanroom lithography process for microfabrication
Year:
2023
Region / City:
New York
Topic:
Self-leveling concrete topping installation
Document Type:
Technical Specification
Organization / Institution:
Duraamen Engineered Products Inc.
Author:
Duraamen Engineering
Target Audience:
Construction professionals, installers
Effective Period:
Ongoing
Approval Date:
Not specified
Modification Date:
Not specified
Batch name:
Process template
Objective:
Guideline for spin coating, exposure, and development of AZ nLOF 2020
Resist:
AZ nLOF 2020
Substrate size:
4” substrates
Substrate materials:
Si, SiO2, Borofloat
Process type:
UV lithography
Equipment:
Gamma UV Spin Coater, KS Aligner, MA6 – 2 Mask Aligner, Automatic Developer (TMAH UV-lithography), Optical Microscope
Pretreatment options:
BHF dip (30 s, H2O 5 min) or HMDS treatment
Spin parameters:
30 s @ 3300 rpm (2 µm)
Softbake:
60 s @ 110 °C
Exposure mode:
Soft contact
Exposure dose:
112 mJ/cm2
Post Exposure Bake:
60 s @ 110 °C (120 s recommended for Borofloat)
Developer:
TMAH (AZ 726 MIF)
Development time:
30 s or 60 s (single puddle)
Inspection method:
Optical microscopy
Application context:
Cleanroom lithography process for microfabrication
Authors:
Muhammad Ishaq; Muhammad Fiaz; Zain ul Wahab; Saifullah; Shariat Ullah
Institutions:
Department of Botany, Hazara University Mansehra, Pakistan; Faculty of Crop Protection Sciences, The University of Agriculture Peshawar, Pakistan; Department of Botany, University of Malakand, Pakistan
Academic field:
Mycology; Agricultural Science; Mushroom Cultivation
Type of document:
Scientific research article
Study organism:
Pleurotus floridanus Singer
Research location:
Peshawar, Pakistan
Research facility:
Mushroom Laboratory, The University of Agriculture Peshawar
Materials studied:
Wheat straw; Paddy straw; Wheat bran; Lime
Experimental design:
Completely Randomized Design (CRD) with eight replicates
Methodology:
Substrate fermentation, pasteurization, spawn inoculation, incubation, controlled humidity and temperature cultivation, yield measurement, ANOVA statistical analysis
Measured variables:
Mycelial growth rate; Pinhead appearance; Maturity time; Flush-wise yield; Total yield; Biological efficiency
Substrate supplements:
Wheat bran 15%; Lime 4%
Statistical software:
Statistix 8.1
Keywords:
Agro-wastes; Biological efficiency; Flush wise yield; Pleurotus floridanus; Total yield
Year:
2025
Region / City:
Nauni, Solan (H.P.)
Topic:
Microbial Enzyme Activity in Compost
Document Type:
Research Article
Organization / Institution:
Dr. Y.S. Parmar University of Horticulture and Forestry
Author:
Not specified
Target Audience:
Agricultural researchers, mushroom farmers
Period of Activity:
Not specified
Approval Date:
Not specified
Date of Changes:
Not specified
Year:
Not specified
Region / City:
Not specified
Topic:
Concrete Surface Repair and Resurfacing
Document Type:
Product Specification
Organization / Institution:
Hychem
Author:
Not specified
Target Audience:
Construction professionals, contractors
Validity Period:
Not specified
Approval Date:
Not specified
Amendment Date:
Not specified
Note:
Description
Year:
2016
Region / city:
Sydney
Subject:
DNA/RNA extraction, laboratory safety
Document type:
Standard Operating Procedure
Organization:
The University of Sydney
Author:
Coleman, N.; Nikolic, A.
Target audience:
Laboratory personnel, researchers
Period of validity:
Ongoing
Approval date:
Not specified
Modification date:
Not specified
Year:
2026
Region / City:
N/A
Topic:
Quantum Computing
Document Type:
Scientific Publication
Organization / Institution:
HRL
Author:
N/A
Target Audience:
Researchers, Engineers, Scientists
Effective Period:
N/A
Approval Date:
N/A
Date of Changes:
N/A
Year:
2018
Region / City:
Global
Subject:
Tire standards, snow traction testing
Document Type:
Technical communication
Organization:
ASTM Committee F09 on Tires
Author:
ASTM Task Force on E1136/F1805 Winter Traction
Target Audience:
Industry groups, government regulators, standards organizations
Period of Application:
Post-2019
Approval Date:
May 2015
Date of Changes:
June 2017
Year:
2024
Region / City:
Scotland
Topic:
Renewable energy, public inquiries, DPEA guidance
Document Type:
Policy commentary
Organization / Institution:
Scotland Against Spin
Author:
Not specified
Target Audience:
Stakeholders in public inquiries, energy policy, and legal frameworks
Period of Validity:
Not specified
Approval Date:
Not specified
Date of Amendments:
Not specified
Batch name:
Process template
Objective:
Guideline for spin coating, exposure, and development of AZ nLOF 2020
Resist:
AZ nLOF 2020
Substrate size:
4” substrates
Substrate materials:
Si, SiO2, Borofloat
Process type:
UV lithography
Equipment:
Gamma UV Spin Coater, KS Aligner, MA6 – 2 Mask Aligner, Automatic Developer (TMAH UV-lithography), Optical Microscope
Pretreatment options:
BHF dip (30 s, H2O 5 min) or HMDS treatment
Spin parameters:
30 s @ 3300 rpm (2 µm)
Softbake:
60 s @ 110 °C
Exposure mode:
Soft contact
Exposure dose:
112 mJ/cm2
Post Exposure Bake:
60 s @ 110 °C (120 s recommended for Borofloat)
Developer:
TMAH (AZ 726 MIF)
Development time:
30 s or 60 s (single puddle)
Inspection method:
Optical microscopy
Application context:
Cleanroom lithography process for microfabrication
Promotional Period:
January 1, 2025 – March 31, 2025
Program Name:
True Rewards New Member Spin & Win
Organizing Company:
Golden Entertainment, LLC
Participating Properties:
Arizona Charlie’s Casinos; Aquarius Casino Resort; Edgewater Hotel & Casino Resort; Pahrump Nugget; Gold Town Casino; Lakeside Casino; The STRAT Hotel, Casino & Tower
Eligibility:
New True Rewards members aged 21 or older
Exclusions:
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Qualifying Requirement:
Earn 25 same day base slot points within first 24 hours of membership
Maximum Prize:
Up to 500,000 slot points
Additional Prizes (The STRAT):
STRAT Tower Admission and Thrill Ride attractions; hotel stay voucher
Voucher Validity:
Tower admission valid 48 hours; hotel stay voucher valid 180 days excluding holidays and blackout dates
Redemption Method:
Activation at True Rewards kiosk
Limitations:
One prize per member during promotional period; non-transferable; no substitutions or cash redemption; no team play
Funding Source:
Marketing funds
Governing Rules:
Subject to applicable laws and regulations; management decisions final
Publicity Clause:
Winners grant permission for use of name, address, and likeness for promotional purposes
Subject:
Physics
Topic:
Rotational Motion and Angular Dynamics
Type of Document:
Educational Worksheet
Educational Level:
Middle School / Introductory Physics
Concepts Covered:
Angular Velocity, Rotational Inertia, Angular Momentum
Physical Quantities:
Mass (1.5 grams), Radius, Velocity, Time (10 seconds)
Activities Included:
Measurement, Calculation, Comparative Observation
Formulas Provided:
Rotational Inertia = mass × radius × radius; Angular Momentum = mass × velocity × radius × radius
Experimental Variables:
Mass distribution, Radius length, Shape of spinner
Materials Referenced:
Spinner, Pencil, Pennies
Year:
2023
Region / City:
Poznań, Poland
Subject:
Spin wave dynamics, Transport properties, Low-dimensional materials
Document type:
Conference Registration Form
Organ / Institution:
Adam Mickiewicz University in Poznań
Author:
Not specified
Target audience:
Researchers, Students, Conference participants
Period of validity:
July 24 – 28, 2023
Approval date:
Not specified
Date of changes:
Not specified
Context:
Conference registration form for the MagIC+ event, focusing on magnetism, spin wave dynamics, and transport properties in low-dimensional materials.
Note:
Year
Year:
2012-2014
Region / location:
New Zealand (Dunedin, Campbell Island, Catlins, Greymouth, Southland), Tasmania
Subject:
Molecular biology, DNA extraction, PCR purification
Document type:
Research protocol
Institution:
University of Otago, Department of Botany
Author:
Summerfield T. C.
Target audience:
Researchers in molecular biology and mycology
Methods referenced:
Cubero et al. (1999), Summerfield (2003), Ye et al. (2004)
Specimen details:
Voucher specimens with collection dates and locations, held at Otago Regional Herbarium and Department of Conservation
Materials:
EconoSpin® All-In-One Mini Spin Columns, homemade buffers (PEX, WS, EB)
Procedures included:
Sample preparation, tissue disruption, cell lysis, chloroform extraction, spin-column purification of DNA and PCR products
Equipment:
Microcentrifuge, NanoDrop 1000 Spectrophotometer
Reference genome type:
Genomic DNA from lichens and other fungi
Year:
2025
Region / City:
Istanbul, Turkey
Topic:
Energy, Renewable Energy Systems
Document Type:
Conference Paper
Institution:
ICMECE
Authors:
Erol KURT, Kahtalı YAZAR, Richard John BACH
Target Audience:
Researchers in energy systems, academia
Period of validity:
September 8-9, 2025
Approval Date:
2025
Date of Changes:
Not specified
Year:
2026
Region / City:
Hawaii
Theme:
Special Education, Disability Rights
Document Type:
Newsletter
Organization / Institution:
SPIN (Special Parent Information Network)
Author:
SPIN
Target Audience:
Parents, Educators, Lawmakers
Effective Period:
January 2026
Approval Date:
January 2026
Revision Date:
Not specified
Context:
A newsletter providing updates on the legislative process and advocacy opportunities for parents of children with disabilities in Hawaii.
Year:
2026
Date:
March 28, 2026
Time:
8:30 am – 3:30 pm
Location:
UH Manoa Campus Center, 3rd Floor
Type of Document:
Event Announcement
Audience:
Families with children with disabilities and helping professionals
Organizer:
SPIN Conference
Theme:
Celebrating families since 1986
Website:
www.spinconference.org
Contact:
808-586-8126