№ lp_2_1_02168
File format: docx Character count: 17675 File size: 14310 KB
The document provides detailed experimental data on the fabrication and analysis of ferroelectric HfO2 films doped with various elements, highlighting the effects of annealing conditions on material properties.
Year: 2023
Region / City: Tsukuba, Ibaraki, Japan
Topic: Ferroelectrics, Material Science
Document Type: Research Paper
Institution: National Institute of Advanced Industrial Science and Technology (AIST)
Authors: Shutaro Asanuma, Hiroyuki Ota, Yukinori Morita, Shogo Hatayama, Shinji Migita
Target Audience: Researchers in Material Science, Semiconductor Technology
Period of Validity: Not specified
Approval Date: Not specified
Date of Changes: Not specified
Price: 8 / 10 USD
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