№ files_lp_4_process_3_090932
The document describes the architecture and components of the Central Control System (CCS) developed for the KTX reversed field pinch (RFP) device, focusing on its integration and supervision of all subsystems involved in the plasma control process.
Year: 2015
Region / City: China
Subject: Plasma Physics, Control Systems
Document Type: Research Paper
Organization / Institution: University of Science and Technology of China, Institute of Plasma Physics at the Chinese Academy of Science
Authors: Z. Zhang, B. Xiao, F. Wang, Z. Ji, Y. Wang, P. Wang, Z. Xu, T. Ma, T. Lan, H. Li, W. Liu
Target Audience: Researchers, Engineers, Scientists in Plasma Physics
Period of Activity: 2015 and beyond
Approval Date: Not specified
Date of Modifications: Not specified
Price: 8 / 10 USD
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